Semiconductor Parts cleaning technologies |
The semiconductor industry faces great difficulties in maintaining process cleanliness because the characteristics of semiconductor components are sensitive and require ultra-precision cleaning. To extend component life and ensure high production yields, it is important to strike a balance between removing contaminants and maintaining material integrity. It is important that the introduction of ultra-precision cleaning technologies is essential along with the continuous advancement of processes to meet the changing demands of semiconductor manufacturing. |
The materials used in semiconductor devices include aluminum, quartz, ceramic, stainless steel, etc., and they are manufactured in various shapes depending on the process. As the process progresses, metal, carbon, oil, wax, residue resist, fingerprint, and various compounds accumulate on these parts. The cleaning method to remove them includes wet cleaning using chemicals, dry cleaning (bead blasting), water jet, CO2 spray, ultra sonic, plasma, etc. The advantage of wet cleaning is that it has high cleaning cost and productivity, but the reason why traditional cleaning agents are used is that contaminants attached to semiconductor parts can only be combined with toxic and highly corrosive chemicals such as hydrofluoric acid (HF). The combination of cleaning agents currently in use is universal and can be procured at low cost, and can remove deposits formed on parts, but the reality is that most parts are damaged due to the low material and selectivity of the parts. Recently, as the line width of semiconductor circuits has become ultra-fine, contamination control management directly related to production yield has become more severe, requiring ultra-precision cleaning of semiconductor components. Cham Clean supplies precision chemicals that do not damage components at all to reduce the cost of purchasing expensive components and to manage them. |
Aluminum Parts
Anodized Aluminum Parts
Ceramic Parts
Quartz Parts
Stainless Steel Parts
Turbo Moecular & CRYO Pump cleaning technologies |
Turbo Pump: A turbo pump is a type of vacuum pump used to create and maintain high vacuum in the semiconductor industry. It operates on the principle of turbine blades mounted on a rotor. The pump consists of a series of rotating and stationary blades stacked on top of each other. Cryo Pump: Cryogenic Pump (CRYO Pump) is a type of vacuum pump that uses cryogenics to achieve high vacuum levels. It operates on the principle of freezing and trapping gases to create a vacuum. It is made of various materials, and physical (Bead Blasting, Blushing) cleaning methods for attached contaminants cause damage to the parts. |
The turbine blade is made of aluminum alloy, and the surface is coated with nickel to provide wear resistance and corrosion resistance against corrosive gases. Furthermore, the nickel-coated blade with a smooth surface can reduce the friction and drag of gas molecules when rotating at high speed, thereby improving the efficiency of the pumping process. üBead Blast and Blushing physical cleaning methods for removing various complex scales fouled on the internal parts of the pump cause damage to the metal surface. Cham Clean supplies cleaning agents for Wet Cleaning. |